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Outputs (52)

A photolithographic process for grossly non-planar substrates. (2008)
Presentation / Conference Contribution
Williams, G. L., McWilliam, R., Toriz-Garcia, J., Curry, R., Maiden, A., Seed, L. N., Purvis, A., & Ivey, P. A. (2008, March). A photolithographic process for grossly non-planar substrates. Presented at Advanced Lithography, San Jose, CA, USA

Photolithographic Patterning of Bi-Helical Tracks onto Conical Substrates (2007)
Journal Article
Purvis, A., McWilliam, R., Johnson, S., Seed, N., Williams, G., Maiden, A., & Ivey, P. (2007). Photolithographic Patterning of Bi-Helical Tracks onto Conical Substrates. Journal of Micro/Nanopatterning, Materials, and Metrology, 6(4), https://doi.org/10.1117/1.2824377

We demonstrate the direct photolithographic patterning of a grossly non-planar substrate by creating 62 micron helical tracks on a 22 mm high cone. The projection of focused light on to the three dimensional surface is achieved using a computer gener... Read More about Photolithographic Patterning of Bi-Helical Tracks onto Conical Substrates.

Non-Planar Photolithography Using Digital Holograms (2006)
Presentation / Conference Contribution
McWilliam, R., Purvis, A., Johnson, S., Maiden, A., Williams, G., Seed, L., & Ivey, P. (2006, October). Non-Planar Photolithography Using Digital Holograms. Presented at Frontiers in Optics 2006 : Laser Science XXII, Rochester, New York

A photolithographic process using digital holograms enables the fine-pitch patterning of grossly non-planar substrates, with many potential applications in microelectronics packaging. Considerations of hologram design, fabrication and verification pa... Read More about Non-Planar Photolithography Using Digital Holograms.

Photolithography on Three Dimensional Substrates (2006)
Presentation / Conference Contribution
Ivey, P., McWilliam, R., Maiden, A., Williams, G., Purvis, A., & Seed, N. (2023, May). Photolithography on Three Dimensional Substrates. Presented at 56th Electronic Components and Technology Conference (ECTC 2006), San Diego, California

Photolithography is the primary technique for patterning planar substrates. However, some higher-density packaging solutions require fine features to be patterned onto grossly non-planar substrates, for example, in mechanical, optical and fluidic mic... Read More about Photolithography on Three Dimensional Substrates.

Potential Uses of Embedded RFID in Appliance Identification (2006)
Journal Article
McWilliam, R., & Purvis, A. (2006). Potential Uses of Embedded RFID in Appliance Identification. International appliance manufacturing, 10, 100-107

Radio Frequency Identification (RFID) has become a pervasive technology for the purpose of tracking goods through the supply chain. It is possible to adapt this radio technology such that remote identification is possible using the electrical power c... Read More about Potential Uses of Embedded RFID in Appliance Identification.

Photolithography on grossly non-planar substrates (2005)
Presentation / Conference Contribution
Williams, G., McWilliam, R., Maiden, A., Purvis, A., Ivey, P., & Seed, N. (2005, June). Photolithography on grossly non-planar substrates. Presented at Proceedings of 7th IEEE CPMT Conference on High Density Microsystem Design, Packaging and Failure Analysis., Shanghai, China

Within the electronics industry, photolithography is the primary technique by which patterns are transferred from mask to substrate. The substrates are either semiconductor wafers or printed circuit boards, both of which are nominally flat. The growt... Read More about Photolithography on grossly non-planar substrates.

Nonplanar photolithography with computer-generated holograms (2005)
Journal Article
Maiden, A., McWilliam, R., Purvis, A., Johnson, S., Williams, G., Seed, N., & Ivey, P. (2005). Nonplanar photolithography with computer-generated holograms. Optics Letters, 30(11), 1300-1302. https://doi.org/10.1364/ol.30.001300

We outline a method for accomplishing photolithography on grossly nonplanar substrates. First we compute an approximation of the diffraction pattern that will produce the desired light-intensity distribution on the substrate to be patterned. This pat... Read More about Nonplanar photolithography with computer-generated holograms.

Non-Planar Interconnect (2005)
Journal Article
Williams, G., Seed, N., Purvis, A., Maiden, A., McWilliam, R., Ivey, P., & Johnson, S. (2005). Non-Planar Interconnect. Circuit World, 31(2), 10-14. https://doi.org/10.1108/03056120510571798

Purpose – This paper describes a method for patterning fine line interconnections over non-planar surfaces and introduces the idea of using holographic masks for more challenging geometries. Design/methodology/approach – A photolithographic method fo... Read More about Non-Planar Interconnect.

Holographic Lithography (2004)
Patent
Purvis, A., McWilliam, R., Seed, N., Williams, G., Ivey, P., Maiden, A., & Johnson, S. Holographic Lithography. WO2006021818

Method of generating a holographic diffraction pattern and a holographic lithography system are disclosed, the method comprising the steps of: defining at least one geometrical shape; generating at least one line segment to represent the at least one... Read More about Holographic Lithography.

Mains Appliance Identification for Electrical Safety Test System. (2002)
Presentation / Conference Contribution
McWilliam, R., & Purvis, A. (2002, March). Mains Appliance Identification for Electrical Safety Test System. Presented at Proc. 6th International Symposium on Power-Line Communications and its Applications., Athens, Greece