P.A. Ivey
Photolithography on Three Dimensional Substrates
Ivey, P.A.; McWilliam, R.; Maiden, A.; Williams, G.L.; Purvis, A.; Seed, N.L.
Authors
R. McWilliam
A. Maiden
G.L. Williams
Professor Alan Purvis alan.purvis@durham.ac.uk
College Mentor
N.L. Seed
Contributors
S Johnson des0sj@durham.ac.uk
Other
Abstract
Photolithography is the primary technique for patterning planar substrates. However, some higher-density packaging solutions require fine features to be patterned onto grossly non-planar substrates, for example, in mechanical, optical and fluidic microsystems and in novel packaging schemes. Standard photolithography cannot be used in these cases because the inevitable gap between the (planar) mask and (non-planar) substrate causes diffractive line broadening and loss of resolution. We address this issue by realising the mask as a Computer Generated Hologram (CGH), which can then be illuminated to generate an image in space corresponding to the required non-planar profile. The CGHs are derived from analytical expressions and encode both amplitude and phase information. We illustrate the performance with a 100μm line exposed onto a substrate in the form of a plane/slope/plane, in which the change in depth is 40mm. Enhancements to the line shape are discussed that make the technique more robust to manufacturing process variations. The fact that features in the range 10-100μm can be imaged at large distance whilst coping with significant changes of depth indicates that the technique shows great potential in the microelectronics packaging industry.
Citation
Ivey, P., McWilliam, R., Maiden, A., Williams, G., Purvis, A., & Seed, N. (2006). Photolithography on Three Dimensional Substrates. In 56th Electronic Components and Technology Conference, 30 May-2 June 2006, San Diego, California ; proceedings (283-288). https://doi.org/10.1109/ectc.2006.1645660
Presentation Conference Type | Conference Paper (Published) |
---|---|
Conference Name | 56th Electronic Components and Technology Conference (ECTC 2006) |
Start Date | May 30, 2023 |
End Date | Jun 2, 2006 |
Publication Date | 2006-05 |
Deposit Date | Nov 29, 2006 |
Publicly Available Date | Nov 1, 2010 |
Pages | 283-288 |
Series ISSN | 0569-5503 |
Book Title | 56th Electronic Components and Technology Conference, 30 May-2 June 2006, San Diego, California ; proceedings. |
DOI | https://doi.org/10.1109/ectc.2006.1645660 |
Public URL | https://durham-repository.worktribe.com/output/1679439 |
Publisher URL | http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?isnumber=34490&arnumber=1645660&count=308&index=236 |
Additional Information | IEEE catalog number 06CH377766C. Conference dates: 30 May-2 June 2006. |
Files
Published Conference Proceeding
(1.8 Mb)
PDF
Copyright Statement
© 2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
You might also like
Modelling the Positional and Orientation Sensitivity of Proximity Sensors.
(2016)
Presentation / Conference Contribution
A Combined Fault Detection and Discrimination Strategy for Resource-Sensitive Platforms
(2016)
Presentation / Conference Contribution
High contrast patterns generated by phase-seeded CGH extensible to 3-D patterns and binary modulation
(2015)
Presentation / Conference Contribution
Strategies for self-repairing electronic systems
(2013)
Presentation / Conference Contribution
Holographic Lithography
(2014)
Presentation / Conference Contribution
Downloadable Citations
About Durham Research Online (DRO)
Administrator e-mail: dro.admin@durham.ac.uk
This application uses the following open-source libraries:
SheetJS Community Edition
Apache License Version 2.0 (http://www.apache.org/licenses/)
PDF.js
Apache License Version 2.0 (http://www.apache.org/licenses/)
Font Awesome
SIL OFL 1.1 (http://scripts.sil.org/OFL)
MIT License (http://opensource.org/licenses/mit-license.html)
CC BY 3.0 ( http://creativecommons.org/licenses/by/3.0/)
Powered by Worktribe © 2024
Advanced Search