Holographic Lithography

Purvis, A.; McWilliam, R.; Seed, N.L.; Williams, G.L.; Ivey, P.A.; Maiden, A.; Johnson, S.

Abstract

Method of generating a holographic diffraction pattern and a holographic lithography system are disclosed, the method comprising the steps of: defining at least one geometrical shape; generating at least one line segment to represent the at least one geometrical shape; calculating a line diffraction pattern on a hologram plane, including calculating the Fresnel diffraction equation for an impulse representing the at least one line segment with a line width control term and a line length control term; and adding vectorially, where there are two or more line segments, the line diffraction patterns to form the holographic diffraction pattern. The method and system enables holographic masks to be generated without creating a physical object to record. The required shapes or patterns are defined in terms of a three-dimensional coordinate space and a holographic pattern is generated at a defined distance from the shapes in the coordinate space. The holographic pattern is usually termed a Computer Generated Hologram (CGH) as the patterns are normally created within computers. A holographic mask (20, 30) can then be created from the holographic pattern to enable the photolithography of a substrate (12).

• Online Publication Date: Aug 24, 2004
• Publication Date: Mar 2, 2006
• Public URL: https://durham-repository.worktribe.com/output/1682227
• Additional Information: Patent URL: http://v3.espacenet.com/textdoc?DB=EPODOC&IDX=WO2006021818&F=0