Nonplanar photolithography with computer-generated holograms

Maiden, A.; McWilliam, R.; Purvis, A.; Johnson, S.; Williams, G.L.; Seed, N.L.; Ivey, P.A.

Abstract

We outline a method for accomplishing photolithography on grossly nonplanar substrates. First we compute an approximation of the diffraction pattern that will produce the desired light-intensity distribution on the substrate to be patterned. This pattern is then digitized and converted into a format suitable for manufacture by a direct-write method. The resultant computer-generated hologram mask is then used in a custom alignment tool to expose the photoresist-coated substrate. The technique has many potential applications in the packaging of microelectronics and microelectromechanical systems.

Citation

Maiden, A., McWilliam, R., Purvis, A., Johnson, S., Williams, G., Seed, N., & Ivey, P. (2005). Nonplanar photolithography with computer-generated holograms. Optics Letters, 30(11), 1300-1302. https://doi.org/10.1364/ol.30.001300

• Journal Article Type: Article
• Publication Date: 2005-06
• Deposit Date: Apr 23, 2008
• Publicly Available Date: Nov 10, 2010
• Journal: Optics Letters
• Print ISSN: 0146-9592
• Electronic ISSN: 1539-4794
• Publisher: Optica
• Peer Reviewed: Peer Reviewed
• Volume: 30
• Issue: 11
• Pages: 1300-1302
• DOI: https://doi.org/10.1364/ol.30.001300
• Keywords: Holography, Imaging systems, Microlithography.
• Public URL: https://durham-repository.worktribe.com/output/1590179
• Publisher URL: http://ol.osa.org/abstract.cfm?id=84040