Improving metal-oxide-metal (MOM) diode performance via the optimization of the oxide layer (2015)
Journal Article
Dodd, L., Shenton, S., Gallant, A., & Wood, D. (2015). Improving metal-oxide-metal (MOM) diode performance via the optimization of the oxide layer. Journal of Electronic Materials, 44(5), 1361-1366. https://doi.org/10.1007/s11664-015-3624-9

Small area metal-oxide-metal (MOM) diodes are being investigated in many research groups for the detection of THz frequency radiation. In order to create a high-speed rectifying device, the central oxide layer of the MOM structure must be thin and ha... Read More about Improving metal-oxide-metal (MOM) diode performance via the optimization of the oxide layer.

Development of Phase Shift Lithography for the Production of Metal-Oxide-Metal Diodes (2014)
Journal Article
Dodd, L., Rosamond, M., Gallant, A., & Wood, D. (2014). Development of Phase Shift Lithography for the Production of Metal-Oxide-Metal Diodes. Micro and Nano Letters, 9(7), 437-440. https://doi.org/10.1049/mnl.2014.0102

Metal-oxide-metal (MOM) diodes have been produced by combining two novel techniques: a reactive ion etche and subsequent plasma oxidation, and a phase shift lithography process. This has resulted in a significant reduction in device feature sizes, do... Read More about Development of Phase Shift Lithography for the Production of Metal-Oxide-Metal Diodes.

Controlled reactive ion etching and plasma regrowth of titanium oxides of known thickness for production of metal-oxide-metal diodes (2013)
Journal Article
Dodd, L., Gallant, A., & Wood, D. (2013). Controlled reactive ion etching and plasma regrowth of titanium oxides of known thickness for production of metal-oxide-metal diodes. Micro and Nano Letters, 8(8), 476-478. https://doi.org/10.1049/mnl.2013.0177

The successful production, via two different oxidation processes, of metal-oxide-metal (MOM) diodes is presented. An innovative reactive ion etching and plasma assisted regrowth process has been used to provide oxides, which are in the thickness rang... Read More about Controlled reactive ion etching and plasma regrowth of titanium oxides of known thickness for production of metal-oxide-metal diodes.

Micromachined Devices for Use in Terahertz Applications (2013)
Journal Article
Wood, D., Chamberlain, M., Baragwanath, A., Dodd, L., Hill, C., & Gallant, A. (2013). Micromachined Devices for Use in Terahertz Applications. Advances in Science and Technology, 81, 20-27. https://doi.org/10.4028/www.scientific.net/ast.81.20

Here we present results from key aspects of our interest in using micromachined devices in the THz region. First, our early work on making filters from rods of gold-coated SU8 is described. Pass (up to 97%) and stop bands can be observed which are th... Read More about Micromachined Devices for Use in Terahertz Applications.

Ti-TiOx-Pt Metal-Oxide-Metal Diodes Fabricated via a Simple Oxidation Technique (2012)
Conference Proceeding
Dodd, L., Gallant, A., & Wood, D. (2012). Ti-TiOx-Pt Metal-Oxide-Metal Diodes Fabricated via a Simple Oxidation Technique. . https://doi.org/10.1557/opl.2012.72

This work presents the successful production, via a simple oxidation process, of Ti-TiOx-Pt Metal-Oxide-Metal diodes with excellent electrical asymmetry. TEM analysis has been used to verify the oxide thickness. A thicker layer produces better diodes... Read More about Ti-TiOx-Pt Metal-Oxide-Metal Diodes Fabricated via a Simple Oxidation Technique.

Optimizing MOM diode performance via the oxidation technique (2011)
Conference Proceeding
Dodd, L., Gallant, A., & Wood, D. (2011). Optimizing MOM diode performance via the oxidation technique. . https://doi.org/10.1109/icsens.2011.6127347

This work presents a study of the effect of a simple oxidation technique on the electrical performance of Ti/TiOx/Pt MOM (metal-oxide-metal) diodes. A fabrication process has been designed to produce devices with a high yield. The I-V characteristics... Read More about Optimizing MOM diode performance via the oxidation technique.