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High fidelity microlithography patterning using computer generated holograms (2009)
Conference Proceeding
McWilliam, R., Purvis, A., Williams, G. L., Toritz-Garcia, J., Seed, L. N., & Ivey, P. A. (2009). High fidelity microlithography patterning using computer generated holograms. In Digital Holography and Three-Dimensional Imaging 2009: Vancouver Canada, 26–30 April 2009. Advances in Imaging, OSA Technical Digest (CD). https://doi.org/10.1364/dh.2009.dwb28

We investigate the achievable fidelity of line patterns produced by iterative and analytically derived computer generated holographic photomasks for the fabrication of microelectronic circuits by photolithographic exposure. Metrics for comparison are... Read More about High fidelity microlithography patterning using computer generated holograms.