High fidelity microlithography patterning using computer generated holograms

McWilliam, Richard; Purvis, Alan; Williams, Gavin L.; Toritz-Garcia, J.; Seed, Luke N.; Ivey, Peter A.

Abstract

We investigate the achievable fidelity of line patterns produced by iterative and analytically derived computer generated holographic photomasks for the fabrication of microelectronic circuits by photolithographic exposure. Metrics for comparison are given.

Citation

McWilliam, R., Purvis, A., Williams, G. L., Toritz-Garcia, J., Seed, L. N., & Ivey, P. A. (2009). High fidelity microlithography patterning using computer generated holograms. In Digital Holography and Three-Dimensional Imaging 2009: Vancouver Canada, 26–30 April 2009. Advances in Imaging, OSA Technical Digest (CD). https://doi.org/10.1364/dh.2009.dwb28

• Presentation Conference Type: Conference Paper (Published)
• Conference Name: Digital holography and three-dimensional Imaging (DH)
• Publication Date: 2009-04
• Publisher: Optical Society of America (OSA)
• Series Title: OSA Optics & Photonics Congress.
• Book Title: Digital Holography and Three-Dimensional Imaging 2009: Vancouver Canada, 26–30 April 2009. Advances in Imaging, OSA Technical Digest (CD)
• DOI: https://doi.org/10.1364/dh.2009.dwb28
• Public URL: https://durham-repository.worktribe.com/output/1159942