Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist
(2010)
Journal Article
Toriz-Garcia, J. J., Williams, G. L., McWilliam, R., Curry, R., Seed, N., Purvis, A., & Ivey, P. A. (2010). Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist. Journal of Micromechanics and Microengineering, 20(1), Article 015012. https://doi.org/10.1088/0960-1317/20/1/015012
We present a novel lithographic process for patterning controlled-width tracks onto anisotropically micromachined silicon. The technique is based on the use of computer-generated holographic masks with a custom alignment and exposure tool. Experiment... Read More about Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist.