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Interface sharpening in CoFeB magnetic tunnel junctions

Pym, A.T.G.; Lamperti, A.; Tanner, B.K.; Dimopoulos, T.; Ruhrig, M.; Wecker, J.

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A.T.G. Pym

A. Lamperti

B.K. Tanner

T. Dimopoulos

M. Ruhrig

J. Wecker


We report grazing incidence x-ray scattering evidence for sharpening of the interface between amorphous Co60Fe20B20 and AlOx during in situ annealing below the Co60Fe20B20 crystallization temperature. Enhancement of the interference fringe amplitude in the specular scatter and the absence of changes in the diffuse scatter indicate that the sharpening is not a reduction in topological roughness but a reduction in the width of the chemical composition profile across the interface. The temperature at which the sharpening occurs corresponds to that at which a maximum is found in the tunneling magnetoresistance of magnetic tunnel junctions.


Pym, A., Lamperti, A., Tanner, B., Dimopoulos, T., Ruhrig, M., & Wecker, J. (2006). Interface sharpening in CoFeB magnetic tunnel junctions. Applied Physics Letters, 88(16),

Journal Article Type Article
Publication Date Apr 17, 2006
Deposit Date Dec 4, 2006
Publicly Available Date Apr 26, 2011
Journal Applied Physics Letters
Print ISSN 0003-6951
Electronic ISSN 1077-3118
Publisher American Institute of Physics
Peer Reviewed Peer Reviewed
Volume 88
Issue 16
Keywords Room temperature, Layers.


Published Journal Article (91 Kb)

Copyright Statement
© 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Pym, A. T. G. and Lamperti, A. and Tanner, B. K. and Dimopoulos, T. and Ruhrig, M. and Wecker, J. (2006) 'Interface sharpening in CoFeB magnetic tunnel junctions.', Applied physics letters., 88 (16). p. 162505 and may be found at

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