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Real-time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in situ experiments

Danilewsky, AN; Wittge, J; Hess, A; Croll, A; Rack, A; Allen, D; McNally, P; Rolo, TD; Vagovic, P; Baumbach, T; Garagorri, J; Elizalde, MR; Tanner, BK

Authors

AN Danilewsky

J Wittge

A Hess

A Croll

A Rack

D Allen

P McNally

TD Rolo

P Vagovic

T Baumbach

J Garagorri

MR Elizalde



Citation

Danilewsky, A., Wittge, J., Hess, A., Croll, A., Rack, A., Allen, D., …Tanner, B. (2011). Real-time X-ray diffraction imaging for semiconductor wafer metrology and high temperature in situ experiments. physica status solidi (a) – applications and materials science, 208(11), 2499-2504. https://doi.org/10.1002/pssa.201184264

Journal Article Type Article
Publication Date 2011
Deposit Date Nov 12, 2012
Journal physica status solidi (a)
Print ISSN 1862-6300
Publisher Wiley
Volume 208
Issue 11
Pages 2499-2504
DOI https://doi.org/10.1002/pssa.201184264
Public URL https://durham-repository.worktribe.com/output/1472088



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