The effect of inertia on gravity-driven thin film free-surface flow over substrates containing topography is considered. Flow is modelled using a depth-averaged form of the governing Navier–Stokes equations and the discrete analogue of the coupled equation set solved accurately using an efficient full approximation storage (FAS) and full multigrid (FMG) technique. The free-surface disturbance induced by topographic features is illustrated by considering examples of gravity-driven flow over and around peak, trench and occlusion topography. Results are presented which demonstrate how increasing Reynolds number can significantly enhance the magnitude of free-surface disturbances, a feature which may have important consequences for the wide range of coating process that aim to maximise free-surface planarity.
Veremieiev, S., Thompson, H., Lee, Y., & Gaskell, P. (2011). Inertial two- and three-dimensional thin film flow over topography. Chemical Engineering and Processing: Process Intensification, 50(5-6), 537-542. https://doi.org/10.1016/j.cep.2010.08.008
Journal Article Type
Aug 6, 2010
Online Publication Date
Aug 13, 2010
May 1, 2011
Jan 26, 2015
Publicly Available Date
Aug 21, 2015
Chemical Engineering and Processing: Process Intensification
Coating, Thin film flows, Microfluidics, Topography.
Accepted Journal Article
NOTICE: this is the author’s version of a work that was accepted for publication in Chemical Engineering and Processing: Process Intensification. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Chemical Engineering and Processing: Process Intensification, 50, 5-6, May 2011, 10.1016/j.cep.2010.08.008.