Nanofabrication using nanotranslated stencil masks and lift off

Racz, Z.; He, J.L.; Srinivasan, S.; Zhao, W.; Seabaugh, A.; Han, K.P.; Ruchhoeft, P.; Wolfe, J.

Abstract

We propose and demonstrate a technique for forming nanometer-scale metal features based on evaporation onto a substrate through a stencil mask. In this work, the stencil mask is laterally translated by a piezoflexure stage, between evaporations of different metals. The metals are chosen based on their etch chemistry to allow one material to be lifted off with respect to another. In this way, sidewall features are formed with dimensions and spacings controlled by moving the translational stage, which has 1 nm resolution.

Citation

Racz, Z., He, J., Srinivasan, S., Zhao, W., Seabaugh, A., Han, K., …Wolfe, J. (2004). Nanofabrication using nanotranslated stencil masks and lift off. Journal of Vacuum Science and Technology B, 22(1), 74-76. https://doi.org/10.1116/1.1637916

• Journal Article Type: Article
• Acceptance Date: Nov 10, 2003
• Online Publication Date: Jan 14, 2004
• Publication Date: Jan 14, 2004
• Deposit Date: Oct 8, 2015
• Publicly Available Date: Nov 23, 2017
• Journal: Journal of Vacuum Science and Technology B
• Print ISSN: 2166-2746
• Electronic ISSN: 2166-2754
• Publisher: American Institute of Physics
• Peer Reviewed: Peer Reviewed
• Volume: 22
• Issue: 1
• Pages: 74-76
• DOI: https://doi.org/10.1116/1.1637916
• Public URL: https://durham-repository.worktribe.com/output/1421200