Jonathan Douglas Major
Assessment of photovoltaic junction position using combined focused ion beam and electron beam-induced current analysis of close space sublimation deposited CdTe solar cells
Major, Jonathan Douglas; Bowen, Leon; Treharne, Robert; Durose, Ken
Authors
Abstract
A major limitation of the cross‐section electron beam‐induced current method—the use of roughly fractured surfaces to provide the cross‐section—has been overcome with the use of focused ion beam microscope sample preparation. Using this method, it was possible to undertake a study of the relation between junction position and the corresponding external quantum efficiency (EQE) curves. For the case of cadmium telluride (CdTe) cells, it was demonstrated that the EQE curve shape that indicates a buried CdTe homojunction only arises if the junction is buried by more than 0.9 µm from the heterointerface. This highlights the limitations of interpreting EQE curve shape to determine junction position. It was also shown that extended postgrowth annealing degrades the cadmium sulfide by Kirkendall voiding, and this leads to efficiency loss.
Citation
Major, J. D., Bowen, L., Treharne, R., & Durose, K. (2014). Assessment of photovoltaic junction position using combined focused ion beam and electron beam-induced current analysis of close space sublimation deposited CdTe solar cells. Progress in Photovoltaics, 22(10), 1096-1104. https://doi.org/10.1002/pip.2507
Journal Article Type | Article |
---|---|
Acceptance Date | Mar 31, 2014 |
Online Publication Date | Jun 2, 2014 |
Publication Date | Oct 1, 2014 |
Deposit Date | Jun 27, 2018 |
Publicly Available Date | Jul 17, 2018 |
Journal | Progress in Photovoltaics |
Print ISSN | 1062-7995 |
Electronic ISSN | 1099-159X |
Publisher | Wiley |
Peer Reviewed | Peer Reviewed |
Volume | 22 |
Issue | 10 |
Pages | 1096-1104 |
DOI | https://doi.org/10.1002/pip.2507 |
Public URL | https://durham-repository.worktribe.com/output/1327799 |
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Copyright Statement
© 2014 The Authors. Progress in Photovoltaics: Research and Applications published by John Wiley & Sons, Ltd. This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
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