High contrast patterns generated by phase-seeded CGH extensible to 3-D patterns and binary modulation

McWilliam, R.; Purvis, A.; Williams, G.L.; Soulard, F.B.; Seed, N.L.

Abstract

By pre-seeding the phase distribution of a point-oriented CGH, controlled-width line patterns are generated with high contrast (>0.6) for precision imaging applications such as photolithography. The approach is extensible to binary phase CGH and 3-D line patterns.

Citation

McWilliam, R., Purvis, A., Williams, G., Soulard, F., & Seed, N. (2015, May). High contrast patterns generated by phase-seeded CGH extensible to 3-D patterns and binary modulation. Presented at Digital Holography and Three-Dimensional Imaging 2015, Shanghai

• Presentation Conference Type: Conference Paper (published)
• Conference Name: Digital Holography and Three-Dimensional Imaging 2015
• Acceptance Date: May 12, 2015
• Publication Date: May 28, 2015
• Deposit Date: Jun 15, 2015
• Publisher: Optical Society of America (OSA)
• Series Title: OSA technical digest
• Book Title: Digital holography and three-dimensional imaging : 24-28 May 2015, Shanghai, China ; OSA annual topical meeting.
• DOI: https://doi.org/10.1364/dh.2015.dth4a.4
• Public URL: https://durham-repository.worktribe.com/output/1152365