Model for large-area monolayer coverage of polystyrene nanospheres by spin coating (2017)
Journal Article
Chandramohan, A., Sibirev, N., Dubrovskii, V., Petty, M., Gallant, A., & Zeze, D. (2017). Model for large-area monolayer coverage of polystyrene nanospheres by spin coating. Scientific Reports, 7, Article 40888. https://doi.org/10.1038/srep40888

Nanosphere lithography, an inexpensive and high throughput technique capable of producing nanostructure (below 100 nm feature size) arrays, relies on the formation of a monolayer of self-assembled nanospheres, followed by custom-etching to produce na... Read More about Model for large-area monolayer coverage of polystyrene nanospheres by spin coating.