Computer Aided Patterning Design for Self-Assembled Microsphere Lithography (SA-MSL) (2019)
Journal Article
Lees, R., Cooke, M., Balocco, C., & Gallant, A. (2019). Computer Aided Patterning Design for Self-Assembled Microsphere Lithography (SA-MSL). Scientific Reports, 9, Article 12849. https://doi.org/10.1038/s41598-019-48881-z

In this paper, we use a finite difference time domain solver to simulate the near field optical properties of self-assembled microsphere arrays when exposed to an incoherent light source. Such arrays are typically used for microsphere lithography whe... Read More about Computer Aided Patterning Design for Self-Assembled Microsphere Lithography (SA-MSL).