Outputs (4)

Applying refractive beam shapers to improve other beam shaping techniques (2010)
Presentation / Conference Contribution
Laskin, A., Williams, G., McWilliam, R., & Laskin, V. (2010, August). Applying refractive beam shapers to improve other beam shaping techniques. Presented at Laser Beam Shaping XI, San Diego, California, USA

Refractive beam shapers of the field mapping type find use in various industrial, scientific and medical applications, where generation of a collimated beam of uniform intensity is required. Due to their unique features, such as: low output divergenc... Read More about Applying refractive beam shapers to improve other beam shaping techniques.

Holographic Photolithography for 3D Integration (2010)
Presentation / Conference Contribution
Williams, G., Toriz-Garcia, J., McWilliam, R., Seed, L., Purvis, A., & Ivey, P. (2010, March). Holographic Photolithography for 3D Integration. Presented at Design, Automation & Test in Europe (DATE) 2010, Dresden, Germany

Design of a self-assembling, repairing and reconfiguring Arithmetic Logic Unit (2010)
Book Chapter
Jones, D., McWilliam, R., & Purvis, A. (2010). Design of a self-assembling, repairing and reconfiguring Arithmetic Logic Unit. In A. Lazinica (Ed.), New Advanced Technologies (161-176). Intech Education and Publishing

Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist (2010)
Journal Article
Toriz-Garcia, J. J., Williams, G. L., McWilliam, R., Curry, R., Seed, N., Purvis, A., & Ivey, P. A. (2010). Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist. Journal of Micromechanics and Microengineering, 20(1), Article 015012. https://doi.org/10.1088/0960-1317/20/1/015012

We present a novel lithographic process for patterning controlled-width tracks onto anisotropically micromachined silicon. The technique is based on the use of computer-generated holographic masks with a custom alignment and exposure tool. Experiment... Read More about Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist.