S. Azzawi
Synthetic route to low damping in ferromagnetic thin-films
Azzawi, S.; Umerski, A.; Sampaio, L. C.; Bunyaev, S. A.; Kakazei, G. N.; Atkinson, D.
Authors
A. Umerski
L. C. Sampaio
S. A. Bunyaev
G. N. Kakazei
Professor Del Atkinson del.atkinson@durham.ac.uk
Professor
Abstract
Previous theory indicated that the individual monolayers within transition metal ferromagnet thin-films contribute different magnitudes to the total ferromagnetic damping. Here, the aim was to investigate if the thin-film damping could be reduced by electronic engineering of the higher damping regions via localized doping. We present new theoretical analysis and experimental results for sputtered Co thin-films in which the upper and lower surface regions were locally doped with Cr. Theory indicates that local doping does reduce the damping and the experiments show a comparable reduction of the damping with increasing local doping up to 30% Cr, while the measured damping falls further with higher local doping, which may be attributed to changes in the film structure. This work opens a route to create low-damping magnetic thin-films.
Citation
Azzawi, S., Umerski, A., Sampaio, L. C., Bunyaev, S. A., Kakazei, G. N., & Atkinson, D. (2023). Synthetic route to low damping in ferromagnetic thin-films. APL Materials, 11(8), Article 081108. https://doi.org/10.1063/5.0147172
Journal Article Type | Article |
---|---|
Acceptance Date | Jul 13, 2023 |
Online Publication Date | Aug 4, 2023 |
Publication Date | Aug 1, 2023 |
Deposit Date | Aug 18, 2023 |
Publicly Available Date | Aug 18, 2023 |
Journal | APL Materials |
Electronic ISSN | 2166-532X |
Publisher | American Institute of Physics |
Peer Reviewed | Peer Reviewed |
Volume | 11 |
Issue | 8 |
Article Number | 081108 |
DOI | https://doi.org/10.1063/5.0147172 |
Keywords | General Engineering; General Materials Science |
Public URL | https://durham-repository.worktribe.com/output/1721233 |
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Copyright Statement
© 2023 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
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