AR Beattie
Hole impactionization rates in InP and In<SUB>0.53</SUB>Ga<SUB>0.47</SUB>As.
Beattie, AR; Abram, RA; Scharoch, P
Citation
Beattie, A., Abram, R., & Scharoch, P. (1992). Hole impactionization rates in InP and In0.53Ga0.47As. Semiconductor Science and Technology, 7, B512-B516
Journal Article Type | Article |
---|---|
Publication Date | 1992 |
Journal | Semiconductor Science and Technology |
Print ISSN | 0268-1242 |
Electronic ISSN | 1361-6641 |
Publisher | IOP Publishing |
Volume | 7 |
Pages | B512-B516 |
Public URL | https://durham-repository.worktribe.com/output/1619708 |
Publisher URL | http://adsabs.harvard.edu/cgi-bin/nph-bib_query?bibcode=1992SeScT...7B.512B&db_key=PHY |
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