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X-ray Topographic Studies Of Dislocation Contrast In Silicon After Boron Diffusion

Tanner, BK

Authors



Citation

Tanner, B. (1973). X-ray Topographic Studies Of Dislocation Contrast In Silicon After Boron Diffusion. Journal of Applied Crystallography, 6, 31-38

Journal Article Type Article
Publication Date 1973
Journal Journal of Applied Crystallography
Print ISSN 0021-8898
Electronic ISSN 1600-5767
Publisher International Union of Crystallography
Volume 6
Pages 31-38
Public URL https://durham-repository.worktribe.com/output/1611601