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Influence of alloy composition and interlayer thickness on twist and tilt mosaic in Al<SUB>x</SUB>Ga<SUB>1-x</SUB>N/AlN/GaN heterostructures

Lafford, T.A.; Parbrook, P.J.; Tanner, B.K.

Influence of alloy composition and interlayer thickness on twist and tilt mosaic in Al<SUB>x</SUB>Ga<SUB>1-x</SUB>N/AlN/GaN heterostructures Thumbnail


Authors

T.A. Lafford

P.J. Parbrook



Abstract

High-resolution x-ray diffraction, in surface symmetric, skew symmetric, and grazing incidence in-plane diffraction geometries, has been used to investigate the effect of an AlN interlayer between micron thick GaN and AlxGa1–xN layers grown by metalorganic vapor phase epitaxy on basal plane sapphire. No change is found in the tilt mosaic (threading screw dislocation density) with thickness or Al fraction x of the upper layer. A linear increase in the twist mosaic (threading edge dislocation density) was observed as a function of interlayer thickness and x. For all samples the twist mosaic of the AlGaN was significantly greater, by at least a factor of two, than that of the GaN layer. With increasing interlayer thickness the in-plane lattice parameter of the AlGaN decreased. The results are explained in terms of extra threading edge dislocations resulting from relaxation at the GaN/AlN interface.

Citation

Lafford, T., Parbrook, P., & Tanner, B. (2003). Influence of alloy composition and interlayer thickness on twist and tilt mosaic in AlxGa1-xN/AlN/GaN heterostructures. Applied Physics Letters, 83(26), 5434-5436. https://doi.org/10.1063/1.1637717

Journal Article Type Article
Publication Date Dec 29, 2003
Deposit Date Jan 9, 2009
Publicly Available Date Apr 21, 2011
Journal Applied Physics Letters
Print ISSN 0003-6951
Electronic ISSN 1077-3118
Publisher American Institute of Physics
Peer Reviewed Peer Reviewed
Volume 83
Issue 26
Pages 5434-5436
DOI https://doi.org/10.1063/1.1637717
Keywords Aluminium compounds, Gallium compounds, III-V semiconductors, Wide band gap semiconductors, X-ray diffraction, Semiconductor heterojunctions, Tilt boundaries, Twist boundaries, MOCVD coatings, Vapour phase epitaxial growth, Semiconductor growth.
Public URL https://durham-repository.worktribe.com/output/1611492

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Copyright Statement
© 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Lafford, T. A. and Parbrook, P. J. and Tanner, B. K. (2003) 'Influence of alloy composition and interlayer thickness on twist and tilt mosaic in AlxGa1-xN/AlN/GaN heterostructures.', Applied physics letters., 83 (26). pp. 5434-5436 and may be found at http://dx.doi.org/10.1063/1.1637717






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