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Comparison of CxNy : H films obtained by deposition using magnetronsputtering or an inductively coupled plasma

Zeze, DA; North, DR; Brown, NMD; Anderson, CA

Authors

DR North

NMD Brown

CA Anderson



Citation

Zeze, D., North, D., Brown, N., & Anderson, C. (2000). Comparison of CxNy : H films obtained by deposition using magnetronsputtering or an inductively coupled plasma. Surface and Interface Analysis, 29(6), 369-376

Journal Article Type Article
Publication Date 2000-06
Journal Surface and Interface Analysis
Print ISSN 0142-2421
Publisher Wiley
Peer Reviewed Peer Reviewed
Volume 29
Issue 6
Pages 369-376
Keywords CN/DLC-PECVD/inductively coupled plasma; XPSCARBON NITRIDE FILMS; RAY PHOTOELECTRON-SPECTROSCOPY; THIN-FILMS; XPS