Application of a Desk-Side Double-Axis X-Ray Diffractometer for Very Large Area Epilayer Characterization.

Loxley, N.; Bowen, D.K.; Tanner, B.K.

Abstract

A new desk-side double-axis X-ray diffractometer capable of rapid, automatic measurement of lattice mismatch between epitaxial thin films and substrate in a two dimensional grid 150 mm square has been built. The design principles behind the five independent axis systems, specimen loading, and the fail-to-safety X-ray shutter are elucidated, and examples of typical data from substrate material and thin epitaxial films of III-V compounds are presented.

Citation

Loxley, N., Bowen, D., & Tanner, B. (1990). Application of a Desk-Side Double-Axis X-Ray Diffractometer for Very Large Area Epilayer Characterization. MRS proceedings, 208, 119-124. https://doi.org/10.1557/proc-208-119

• Journal Article Type: Article
• Publication Date: 1990
• Journal: MRS Online Proceedings Library
• Print ISSN: 0272-9172
• Electronic ISSN: 1946-4274
• Publisher: North-Holland
• Peer Reviewed: Peer Reviewed
• Volume: 208
• Pages: 119-124
• DOI: https://doi.org/10.1557/proc-208-119
• Public URL: https://durham-repository.worktribe.com/output/1579439