A new route to the production and nanoscale patterning of highly smooth, ultrathin zirconium oxide films

Watson, SMD; Coleman, KS; Chakraborty, AK

Abstract

Metal-stabilized bilayers, prepared by the self-assembly of octaclecyltrichorosilane on an oxidized silicon surface followed by the Langmuir-Blodgett deposition of a monolayer of octadecylphosphonic acid, have been used to generate 1.6 nanometer thick, highly uniform, zirconium oxide films following annealing. Patterning of the thin films on the nanometre scale was achieved using nanodisplacement methodology, by careful control of an atomic force microscope (AFM) probe, which allowed the selective removal of the upper leaflet of the bilayer.

Citation

Watson, S., Coleman, K., & Chakraborty, A. (2008). A new route to the production and nanoscale patterning of highly smooth, ultrathin zirconium oxide films. ACS Nano, 2(4), 643-650. https://doi.org/10.1021/nn700138q

• Journal Article Type: Article
• Publication Date: 2008-04
• Journal: ACS Nano
• Print ISSN: 1936-0851
• Electronic ISSN: 1936-086X
• Publisher: American Chemical Society
• Volume: 2
• Issue: 4
• Pages: 643-650
• DOI: https://doi.org/10.1021/nn700138q
• Keywords: Zirconium oxide, AFM, Nanoscale patterning, Ultrathin films, Langmuir-Blodget, Nanodisplacement, Nanoshaving, Self-assembled Monolayers, Scanning tunneling microscope, Electron-beam lithography, Thin-films, Probe lithography