J Wittge
X-ray diffraction imaging of dislocation generation related to microcracks in Si wafers
Wittge, J; Danilewsky, A; Allen, D; McNally, P; Li, ZJ; Baumbach, T; Gorostegui-Colinas, E; Garagorri, J; Elizalde, MR; Jacques, D; Fossati, MC; Bowen, DK; Tanner, BK
Authors
A Danilewsky
D Allen
P McNally
ZJ Li
T Baumbach
E Gorostegui-Colinas
J Garagorri
MR Elizalde
D Jacques
MC Fossati
DK Bowen
Professor Brian Tanner b.k.tanner@durham.ac.uk
Emeritus Professor
Citation
Wittge, J., Danilewsky, A., Allen, D., McNally, P., Li, Z., Baumbach, T., …Tanner, B. (2010). X-ray diffraction imaging of dislocation generation related to microcracks in Si wafers. Powder Diffraction, 25(2), 99-103. https://doi.org/10.1154/1.3392369
Journal Article Type | Article |
---|---|
Publication Date | 2010-06 |
Deposit Date | Jun 24, 2011 |
Journal | Powder Diffraction |
Print ISSN | 0885-7156 |
Electronic ISSN | 1945-7413 |
Publisher | Cambridge University Press |
Volume | 25 |
Issue | 2 |
Pages | 99-103 |
DOI | https://doi.org/10.1154/1.3392369 |
Keywords | X-ray diffraction imaging; topography; dislocation sourceSILICON; TOPOGRAPHY |
Public URL | https://durham-repository.worktribe.com/output/1508250 |
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