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Slip band distribution in rapid thermally annealed silicon wafers

Garagorri, J; Elizalde, MR; Fossati, MC; Jacques, D; Tanner, BK

Authors

J Garagorri

MR Elizalde

MC Fossati

D Jacques



Citation

Garagorri, J., Elizalde, M., Fossati, M., Jacques, D., & Tanner, B. (2012). Slip band distribution in rapid thermally annealed silicon wafers. Journal of Applied Physics, 111(9), Article 094901. https://doi.org/10.1063/1.4709446

Journal Article Type Article
Publication Date 2012-05
Deposit Date Nov 12, 2012
Journal Journal of Applied Physics
Print ISSN 0021-8979
Electronic ISSN 1089-7550
Publisher American Institute of Physics
Volume 111
Issue 9
Article Number 094901
DOI https://doi.org/10.1063/1.4709446
Public URL https://durham-repository.worktribe.com/output/1501306