Quantitative Imaging of the Stress/Strain Fields and Generation of Macroscopic Cracks from Indents in Silicon

Tanner, Brian; Allen, David; Wittge, Jochen; Danilewsky, Andreas; Garagorri, Jorge; Gorostegui-Colinas, Eider; Elizalde, M.; McNally, Patrick

Abstract

The crack geometry and associated strain field around Berkovich and Vickers indents on silicon have been studied by X-ray diffraction imaging and micro-Raman spectroscopy scanning. The techniques are complementary; the Raman data come from within a few micrometres of the indentation, whereas the X-ray image probes the strain field at a distance of typically tens of micrometres. For example, Raman data provide an explanation for the central contrast feature in the X-ray images of an indent. Strain relaxation from breakout and high temperature annealing are examined and it is demonstrated that millimetre length cracks, similar to those produced by mechanical damage from misaligned handling tools, can be generated in a controlled fashion by indentation within 75 micrometres of the bevel edge of 200 mm diameter wafers.

Citation

Tanner, B., Allen, D., Wittge, J., Danilewsky, A., Garagorri, J., Gorostegui-Colinas, E., …McNally, P. (2017). Quantitative Imaging of the Stress/Strain Fields and Generation of Macroscopic Cracks from Indents in Silicon. Crystals, 7(11), Article 347. https://doi.org/10.3390/cryst7110347

• Journal Article Type: Article
• Acceptance Date: Nov 8, 2017
• Online Publication Date: Nov 14, 2017
• Publication Date: Nov 14, 2017
• Deposit Date: Dec 6, 2017
• Publicly Available Date: Dec 6, 2017
• Journal: Crystals
• Publisher: MDPI
• Peer Reviewed: Peer Reviewed
• Volume: 7
• Issue: 11
• Article Number: 347
• DOI: https://doi.org/10.3390/cryst7110347
• Public URL: https://durham-repository.worktribe.com/output/1370060