D. Wang
Exploring the influence of political connections and managerial overconfidence on R&D intensity in China's large-scale private sector firms
Wang, D.; Sutherland, D.; Ning, L.; Wang, Y.; Pan, X.
Abstract
Political ties and managerial cognitive biases, specifically overconfidence, have been identified as affecting firm-level R&D processes and outcomes. Here we further conceptually and empirically explore how these two factors may influence R&D intensity in an emerging market context. Our empirical results, based on panel data from 1293 Chinese publicly listed firms (between 2010 and 2014) show, contrary to some previous research, that stronger formal political ties somewhat reduce firm-level R&D intensity. Greater overconfidence in managers, by contrast, increases R&D intensity. Interestingly, moreover, overconfidence positively moderates the relationship between political ties and R&D intensity to the extent that the weak negative relationship becomes positive in the presence of overconfidence. Our results highlight the role of managerial mindset as an important determinant of R&D intensity in the emerging market context.
Citation
Wang, D., Sutherland, D., Ning, L., Wang, Y., & Pan, X. (2018). Exploring the influence of political connections and managerial overconfidence on R&D intensity in China's large-scale private sector firms. Technovation, 69, 40-53. https://doi.org/10.1016/j.technovation.2017.10.007
Journal Article Type | Article |
---|---|
Acceptance Date | Oct 28, 2017 |
Online Publication Date | Nov 3, 2017 |
Publication Date | Jan 1, 2018 |
Deposit Date | Nov 2, 2017 |
Publicly Available Date | Nov 3, 2019 |
Journal | Technovation |
Print ISSN | 0166-4972 |
Electronic ISSN | 1879-2383 |
Publisher | Elsevier |
Peer Reviewed | Peer Reviewed |
Volume | 69 |
Pages | 40-53 |
DOI | https://doi.org/10.1016/j.technovation.2017.10.007 |
Public URL | https://durham-repository.worktribe.com/output/1345188 |
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Copyright Statement
© 2017 This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/
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