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Self-Catalyzed CdTe Wires

Baines, Tom; Papageorgiou, Giorgos; Hutter, Oliver; Bowen, Leon; Durose, Ken; Major, Jonathan

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Authors

Tom Baines

Giorgos Papageorgiou

Oliver Hutter

Leon Bowen leon.bowen@durham.ac.uk
Senior Manager (Electron Microscopy)

Ken Durose

Jonathan Major



Abstract

CdTe wires have been fabricated via a catalyst free method using the industrially scalable physical vapor deposition technique close space sublimation. Wire growth was shown to be highly dependent on surface roughness and deposition pressure, with only low roughness surfaces being capable of producing wires. Growth of wires is highly (111) oriented and is inferred to occur via a vapor-solid-solid growth mechanism, wherein a CdTe seed particle acts to template the growth. Such seed particles are visible as wire caps and have been characterized via energy dispersive X-ray analysis to establish they are single phase CdTe, hence validating the self-catalysation route. Cathodoluminescence analysis demonstrates that CdTe wires exhibited a much lower level of recombination when compared to a planar CdTe film, which is highly beneficial for semiconductor applications.

Citation

Baines, T., Papageorgiou, G., Hutter, O., Bowen, L., Durose, K., & Major, J. (2018). Self-Catalyzed CdTe Wires. Nanomaterials, 8(5), Article 274. https://doi.org/10.3390/nano8050274

Journal Article Type Article
Acceptance Date Apr 23, 2018
Online Publication Date Apr 25, 2018
Publication Date Apr 25, 2018
Deposit Date Jun 7, 2018
Publicly Available Date Jun 8, 2018
Journal Nanomaterials
Electronic ISSN 2079-4991
Publisher MDPI
Peer Reviewed Peer Reviewed
Volume 8
Issue 5
Article Number 274
DOI https://doi.org/10.3390/nano8050274
Public URL https://durham-repository.worktribe.com/output/1324798

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Published Journal Article (2.2 Mb)
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Publisher Licence URL
http://creativecommons.org/licenses/by/4.0/

Copyright Statement
© 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution
(CC BY) license (http://creativecommons.org/licenses/by/4.0/).





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