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Potential barrier height at the grain boundaries of a poly-silicon nanowire

Shamir, Assaf; Amit, Iddo; Englander, Danny; Horvitz, Dror; Rosenwaks, Yossi

Potential barrier height at the grain boundaries of a poly-silicon nanowire Thumbnail


Authors

Assaf Shamir

Danny Englander

Dror Horvitz

Yossi Rosenwaks



Abstract

We present measurements of the potential barrier height and its dependence on grain size in poly-silicon nanowire (P-SiNW) arrays. Measurements conducted using Kelvin probe force microscopy coupled with electrostatic simulations, enabled us also to extract the density of the grain boundary interface states and their energy distribution. In addition it was shown that the barrier height scales with the grain size as the square of the grain radius.

Citation

Shamir, A., Amit, I., Englander, D., Horvitz, D., & Rosenwaks, Y. (2015). Potential barrier height at the grain boundaries of a poly-silicon nanowire. Nanotechnology, 26(35), Article 355201. https://doi.org/10.1088/0957-4484/26/35/355201

Journal Article Type Article
Acceptance Date Jul 13, 2015
Online Publication Date Aug 6, 2015
Publication Date Sep 4, 2015
Deposit Date Jul 5, 2018
Publicly Available Date Jul 31, 2018
Journal Nanotechnology
Print ISSN 0957-4484
Electronic ISSN 1361-6528
Publisher IOP Publishing
Peer Reviewed Peer Reviewed
Volume 26
Issue 35
Article Number 355201
DOI https://doi.org/10.1088/0957-4484/26/35/355201
Public URL https://durham-repository.worktribe.com/output/1322264

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Copyright Statement
This is an author-created, un-copyedited version of an article accepted for publication/published in Nanotechnology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.1088/0957-4484/26/35/355201






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