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Antireflective Coatings: Conventional Stacking Layers and Ultrathin Plasmonic Metasurfaces, A Mini-Review

Hedayati, Mehdi Keshavarz; Elbahri, Mady

Authors

Mehdi Keshavarz Hedayati

Mady Elbahri



Contributors

Abstract

Reduction of unwanted light reflection from a surface of a substance is very essential for improvement of the performance of optical and photonic devices. Antireflective coatings (ARCs) made of single or stacking layers of dielectrics, nano/microstructures or a mixture of both are the conventional design geometry for suppression of reflection. Recent progress in theoretical nanophotonics and nanofabrication has enabled more flexibility in design and fabrication of miniaturized coatings which has in turn advanced the field of ARCs considerably. In particular, the emergence of plasmonic and metasurfaces allows for the realization of broadband and angular-insensitive ARC coatings at an order of magnitude thinner than the operational wavelengths. In this review, a short overview of the development of ARCs, with particular attention paid to the state-of-the-art plasmonic- and metasurface-based antireflective surfaces, is presented.

Citation

Hedayati, M. K., & Elbahri, M. (2016). Antireflective Coatings: Conventional Stacking Layers and Ultrathin Plasmonic Metasurfaces, A Mini-Review. Materials, 9(6), Article 497. https://doi.org/10.3390/ma9060497

Journal Article Type Article
Acceptance Date Jun 15, 2016
Online Publication Date Jun 21, 2016
Publication Date 2016-06
Deposit Date Oct 1, 2018
Journal Materials
Print ISSN 1996-1944
Publisher MDPI
Peer Reviewed Peer Reviewed
Volume 9
Issue 6
Article Number 497
DOI https://doi.org/10.3390/ma9060497