Nanometer scale patterning using focused ion beam milling

Petit, D.; Faulkner, C.C.; Johnstone, S.; Wood, D.; Cowburn, R.P.

doi:10.1063/1.1844431

Nanometer scale patterning using focused ion beam milling

Petit, D.; Faulkner, C.C.; Johnstone, S.; Wood, D.; Cowburn, R.P.

Authors

D. Petit

C.C. Faulkner

S. Johnstone

D. Wood

R.P. Cowburn

Abstract

We report on the performance of focused ion beam (FIB) milling in order to produce nanometer scale devices. Resolution issues have been systematically studied as a function of emission current and working distance, by imaging single pixel lines FIB milled into thin bismuth films deposited on oxidized silicon. The ion beam profile has been measured, and by carefully optimizing the milling conditions, 40 nm Hall probe sensors have been fabricated.

Citation

Petit, D., Faulkner, C., Johnstone, S., Wood, D., & Cowburn, R. (2005). Nanometer scale patterning using focused ion beam milling. Review of Scientific Instruments, 76(2), Article 026105. https://doi.org/10.1063/1.1844431

Journal Article Type	Article
Publication Date	2005-02
Deposit Date	Jun 5, 2006
Publicly Available Date	Apr 21, 2011
Journal	Review of Scientific Instruments
Print ISSN	0034-6748
Electronic ISSN	1089-7623
Publisher	American Institute of Physics
Peer Reviewed	Peer Reviewed
Volume	76
Issue	2
Article Number	026105
DOI	https://doi.org/10.1063/1.1844431
Public URL	https://durham-repository.worktribe.com/output/1590252

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Copyright Statement
Copyright (2005) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

The following article appeared in (Petit, D. and Faulkner, C. C. and Johnstone, S. and Wood, D. and Cowburn, R. P. (2005) Nanometer scale patterning using focused ion beam milling. Review of scientific instruments., 76 (2). 3. ISSN 0034-6748) and may be found at http://link.aip.org/link/?rsi/76/026105