High fidelity microlithography patterning using computer generated holograms
(2009)
Presentation / Conference Contribution
We investigate the achievable fidelity of line patterns produced by iterative and analytically derived computer generated holographic photomasks for the fabrication of microelectronic circuits by photolithographic exposure. Metrics for comparison are... Read More about High fidelity microlithography patterning using computer generated holograms.