Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist
(2010)
Journal Article
We present a novel lithographic process for patterning controlled-width tracks onto anisotropically micromachined silicon. The technique is based on the use of computer-generated holographic masks with a custom alignment and exposure tool. Experiment... Read More about Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist.