Reactive ion etching of quartz and pyrex for micro electronic applications
(2002)
Journal Article
Zeze, D., Forrest, R., Carey, J., Cox, D., Robertson, I., Weiss, B., & Silva, S. (2002). Reactive ion etching of quartz and pyrex for micro electronic applications. Journal of Applied Physics, 92(7), 3624-3629. https://doi.org/10.1063/1.1503167
The reactive ion etching of quartz and Pyrex substrates was carried out using CF4/Ar and CF4/O2 gas mixtures in a combined radio frequency (rf)/microwave (µw) plasma. It was observed that the etch rate and the surface morphology of the etched regions... Read More about Reactive ion etching of quartz and pyrex for micro electronic applications.