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Reactive ion etching of quartz and pyrex for micro electronic applications (2002)
Journal Article
Zeze, D., Forrest, R., Carey, J., Cox, D., Robertson, I., Weiss, B., & Silva, S. (2002). Reactive ion etching of quartz and pyrex for micro electronic applications. Journal of Applied Physics, 92(7), 3624-3629. https://doi.org/10.1063/1.1503167

The reactive ion etching of quartz and Pyrex substrates was carried out using CF4/Ar and CF4/O2 gas mixtures in a combined radio frequency (rf)/microwave (µw) plasma. It was observed that the etch rate and the surface morphology of the etched regions... Read More about Reactive ion etching of quartz and pyrex for micro electronic applications.

Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma (2002)
Journal Article
Zeze, D., Silva, S., Brown, N., Joyce, A., & Anderson, C. (2002). Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma. Journal of Applied Physics, 91(4), 1819-1827. https://doi.org/10.1063/1.1435417

Study has been initiated of the deposition of thin films using cluster ions in differing abundances generated in a pulsed inductively coupled plasma. A pulse unit controlling the "on" and "off" timing ratio of a 13.56 MHz rf power supply is used to a... Read More about Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma.