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Outputs (7)

Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist (2010)
Journal Article
Toriz-Garcia, J. J., Williams, G. L., McWilliam, R., Curry, R., Seed, N., Purvis, A., & Ivey, P. A. (2010). Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist. Journal of Micromechanics and Microengineering, 20(1), Article 015012. https://doi.org/10.1088/0960-1317/20/1/015012

We present a novel lithographic process for patterning controlled-width tracks onto anisotropically micromachined silicon. The technique is based on the use of computer-generated holographic masks with a custom alignment and exposure tool. Experiment... Read More about Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist.

Sub-Micron 3d Holographic Lithography (2009)
Patent
Purvis, A., McWilliam, R., Curry, R., Andrew, M., Williams, G., Seed, L., …Ivey, P. (2009). Sub-Micron 3d Holographic Lithography

3D maskless holographic photolithography using spatial light modulators (2008)
Presentation / Conference Contribution
McWilliam, R., Purvis, A., Richard, C., Williams, G., Seed, L., Ivey, P., & Toriz-Garcia, J. (2008, August). 3D maskless holographic photolithography using spatial light modulators. Presented at 2nd International Photonics Cluster Summer School, Adlershof, Berlin