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Thermal slip sources at the extremity and bevel edge of silicon wafers (2011)
Journal Article
Tanner, B., Wittge, J., Allen, D., Fossati, M., Danilwesky, A., McNally, P., …Jacques, D. (2011). Thermal slip sources at the extremity and bevel edge of silicon wafers. Journal of Applied Crystallography, 44(3), 489-494. https://doi.org/10.1107/s0021889811012088

High-resolution X-ray diffraction imaging of 200 mm silicon wafers following rapid thermal annealing at a temperature of 1270 K has revealed the presence of many early stage sources of thermal slip associated with the wafer edge. Dislocation sources... Read More about Thermal slip sources at the extremity and bevel edge of silicon wafers.