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Reactions and luminescence in passivated Si nanocrystallites induced by vacuum ultraviolet and soft-x-ray photons

Chao, Y.; Krishnamurthy, S.; Montalti, M.; Lie, L.H.; Houlton, A.; Horrocks, B.R.; Kjeldgaard, L.; Dhanak, V.R.; Hunt, M.R.C.; Šiller, L.

Reactions and luminescence in passivated Si nanocrystallites induced by vacuum ultraviolet and soft-x-ray photons Thumbnail


Authors

Y. Chao

S. Krishnamurthy

M. Montalti

L.H. Lie

A. Houlton

B.R. Horrocks

L. Kjeldgaard

V.R. Dhanak

L. Šiller



Abstract

Alkyl-modified siliconnanocrystallites are efficient fluorophores which are of interest for fundamental spectroscopic studies and as luminescent probes in biology because of their stability in aqueous media. In this work we have investigated these particles using scanning tunneling microscopy, synchrotron-radiation excited photoemission, and x-ray excited optical luminescence (XEOL). During the course of illumination with 145-eVphotons we have monitored the evolution of the Si2p core level and, in samples which have suffered prolonged atmospheric exposure, observed in real time the growth of an extra Si2p component attributed to in situ photoinduced oxidation of the Si nanocrystallites. XEOL reveals that two emission bands are active upon soft-x-ray photon excitation and that photoluminescence intensity decreases with photon exposure, which is attributed to charge trapping within the film.

Citation

Chao, Y., Krishnamurthy, S., Montalti, M., Lie, L., Houlton, A., Horrocks, B., …Šiller, L. (2005). Reactions and luminescence in passivated Si nanocrystallites induced by vacuum ultraviolet and soft-x-ray photons. Journal of Applied Physics, 98(4), Article 044316. https://doi.org/10.1063/1.2012511

Journal Article Type Article
Acceptance Date Jul 7, 2005
Publication Date Aug 15, 2005
Deposit Date Aug 18, 2015
Publicly Available Date Aug 19, 2015
Journal Journal of Applied Physics
Print ISSN 0021-8979
Electronic ISSN 1089-7550
Publisher American Institute of Physics
Peer Reviewed Peer Reviewed
Volume 98
Issue 4
Article Number 044316
DOI https://doi.org/10.1063/1.2012511

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Copyright Statement
© 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics 98, 044316 (2005) and may be found at http://dx.doi.org/10.1063/1.2012511






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