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Gold Nitride: Preparation and Properties

Siller, L.; Alves, L.; Brieva, A.C.; Butenko, Yu.V.; Hunt, M.R.C.

Authors

L. Siller

L. Alves

A.C. Brieva

Yu.V. Butenko



Abstract

We review the currently known methods of producing gold nitride and report on the influence of electrically isolated substrates on the growth of gold nitride films by reactive ion sputtering (RIS). It is found that isolation of the substrate decreases grain size and increases nitrogen content, the latter attributed to longer nitrogen ion lifetime on the surface of the growing film. The chemical reactivity of gold nitride is compared with that of pure gold films using the adsorption of 1-dodecyl mercaptan (CH3(CH2)(11)SH) as a model system and it is found that there is no significant difference between gold films and gold nitride in terms of Au-S binding. However, gold nitride nanoparticles are suggested to be worthy of further investigation in terms of their catalytic properties.

Journal Article Type Article
Publication Date 2009
Deposit Date Oct 7, 2010
Journal Topics in Catalysis
Print ISSN 1022-5528
Electronic ISSN 1572-9028
Publisher Springer
Peer Reviewed Peer Reviewed
Volume 52
Issue 11
Pages 1604-1610
DOI https://doi.org/10.1007/s11244-009-9281-6
Public URL https://durham-repository.worktribe.com/output/1515585