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Inelastic collisions in radiofrequency-dressed mixtures of ultracold atoms

Bentine, Elliot; Barker, Adam J.; Luksch, Kathrin; Sunami, Shinichi; Harte, Tiffany L.; Yuen, Ben; Foot, Christopher J.; Owens, Daniel J.; Hutson, Jeremy M.

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Elliot Bentine

Adam J. Barker

Kathrin Luksch

Shinichi Sunami

Tiffany L. Harte

Ben Yuen

Christopher J. Foot

Daniel J. Owens


Radiofrequency (rf) -dressed potentials are a promising technique for manipulating atomic mixtures, but so far little work has been undertaken to understand the collisions of atoms held within these traps. In this paper, we dress a mixture of 85Rb and 87Rb with rf radiation, characterize the inelastic loss that occurs, and demonstrate species-selective manipulations. Our measurements show the loss is caused by two-body 87Rb+85Rb collisions, and we show the inelastic rate coefficient varies with detuning from the rf resonance. We explain our observations using quantum scattering calculations, which give reasonable agreement with the measurements. The calculations consider magnetic fields both perpendicular to the plane of rf polarization and tilted with respect to it. Our findings have important consequences for future experiments that dress mixtures with rf fields.


Bentine, E., Barker, A. J., Luksch, K., Sunami, S., Harte, T. L., Yuen, B., …Hutson, J. M. (2020). Inelastic collisions in radiofrequency-dressed mixtures of ultracold atoms. Physical Review Research, 2(3), Article 033163.

Journal Article Type Article
Acceptance Date May 29, 2020
Online Publication Date Jul 29, 2020
Publication Date 2020-07
Deposit Date Oct 6, 2020
Publicly Available Date Oct 29, 2020
Journal Physical Review Research
Publisher American Physical Society
Peer Reviewed Peer Reviewed
Volume 2
Issue 3
Article Number 033163
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Copyright Statement
Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

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